发明名称 RADIATION-SENSITIVE POLYMER COMPOSITION, INSULATION FILM, AND ORGANIC EL ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a radiation-sensitive polymer composition which is prepared without using a NMP and can form an insulation film for an organic EL element, the film having good characteristics, and to provide the insulation film and the organic EL element.SOLUTION: There is provided a radiation-sensitive polymer composition comprising (A) at least one kind of polymer selected from a group consisting of polyamic acids obtained by reacting tetracarboxylic acid dianhydrides with diamines, and polyimides formed by dehydration-cyclization of the polyamic acids, (B) a quinone diazide compound, and (C) a solvent. The tetracarboxylic acid dianhydrides have a structure represented by following formula (1).
申请公布号 JP2014074772(A) 申请公布日期 2014.04.24
申请号 JP20120221438 申请日期 2012.10.03
申请人 JSR CORP 发明人 TAKAMATSU NOBUHIRO
分类号 G03F7/023;C08G73/10;G03F7/004;H01L51/50;H05B33/22 主分类号 G03F7/023
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