| 摘要 |
PROBLEM TO BE SOLVED: To provide a projection objective system for microlithography, a projection aligner, a method for manufacturing a semiconductor element and other kinds of micro device by utilizing a projection objective system, and an optical correction plate which can be used as a replaceable element for the projection objective system.SOLUTION: An optical correction plate has a body made of a material transmitting the working radiation, and the body has a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surfaces, and a thickness profile. The first optical surface has a first non-rotationally symmetric aspherical surface profile having a first peak-to-valley value PV1>λ, and the second optical surface has a second non-rotationally symmetric aspherical surface profile having a second peak-to-valley value PV2>λ. They are similar in that the plate thickness varies smaller than 0.1*(PV1+PV2)/2 over the optical correction plate. |
