发明名称 |
ION SOURCE HAVING A SHUTTER ASSEMBLY |
摘要 |
<p>An ion source includes arc chamber housing defining an arc chamber. The arc chamber housing has an extraction plate in a fixed position, and the extraction plate defines a plurality of extraction apertures. The ion source also includes a shutter assembly positioned outside of the arc chamber proximate the extraction plate. The shutter assembly is configured to block at least a portion of one of the plurality of extraction apertures during one time interval. The ion source combined with relative movement of a workpiece to be treated with an ion beam extracted from the ion source enables a two dimensional ion implantation pattern to be formed on the workpiece using only one ion source.</p> |
申请公布号 |
WO2014062515(A1) |
申请公布日期 |
2014.04.24 |
申请号 |
WO2013US64626 |
申请日期 |
2013.10.11 |
申请人 |
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. |
发明人 |
BLAHNIK, JEFFREY CHARLES;WEAVER, WILLIAM T. |
分类号 |
H01J27/04;H01J27/02;H01J27/08;H01J37/08;H01J37/302;H01J37/317 |
主分类号 |
H01J27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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