PRODUCTION METHOD OF POLYMER FOR LITHOGRAPHY, PRODUCTION METHOD OF RESIST COMPOSITION, AND PRODUCTION METHOD OF PATTERNED SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To improve the solubility of a polymer for lithography with a solvent while suppressing a thermal history imparted to the polymer, to improve the productivity, to reduce a process passage time, and thereby, to efficiently produce a polymer having more stable qualities.SOLUTION: A production method of a polymer for lithography includes: a polymerization step of obtaining a polymerization reaction solution by radical polymerization of a monomer by using a polymerization initiator in the presence of a polymerization solvent; and a recovery step of mixing the solution including the polymer obtained in the above polymerization step with a poor solvent for the polymer to precipitate the polymer and obtaining the precipitate. The recovery step of obtaining the precipitate satisfies a condition of expression (1):(solid content weight (g) of the polymer in the polymerization reaction solution)/((volume of the poor solvent (L))×(mixing time (min) of the polymerization reaction solution with the poor solvent))≤2.0.