发明名称 SEMICONDUCTOR DEVICE HAVING BURIED CHANNEL ARRAY
摘要 A semiconductor device includes a field regions in a substrate to define active regions, gate trenches including active trenches disposed across the active region and field trenches in the field regions, and word lines that fill the gate trenches and extend in a first direction. The word lines include active gate electrodes occupying the active trenches, and field gate electrodes occupying the field trenches. The bottom surface of each field gate electrode, which is disposed between active regions that are adjacent to each other and have one word line therebetween, is disposed at a higher level than the bottom surfaces of the active gate electrodes.
申请公布号 US2014110786(A1) 申请公布日期 2014.04.24
申请号 US201313959765 申请日期 2013.08.06
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM NA-RA;KIM SEUNG-HWAN;LEE SUNG-HEE;KIM DAE-SIN;KIM JI-YOUNG;WOO DONG-SOO
分类号 H01L29/78 主分类号 H01L29/78
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