| 摘要 |
A film exposure device (1) is provided with a draw-in mark forming unit (13) that forms draw-in marks (2a) at the leading part of a supplied film (2), such marks serving as reference for the initial position of a mask (12). A detection unit (15) detects the position of draw-in marks in the direction perpendicular to the film movement direction, and according to these detection results the mask position is adjusted. The draw-in marks are formed by, for example, a YAG laser. The detection unit is, for example, a line CCD camera disposed below the mask. With this configuration, when commencing film exposure, the film exposure device can precisely set the mask position and can stably expose film with high exposure accuracy. |
