发明名称 EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
摘要 An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.
申请公布号 EP2721908(A1) 申请公布日期 2014.04.23
申请号 EP20120733533 申请日期 2012.06.12
申请人 GIGAPHOTON INC. 发明人 WAKABAYASHI, OSAMU;YANAGIDA, TATSUYA
分类号 H05G2/00 主分类号 H05G2/00
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