发明名称 METHOD FOR ENHANCING ADHESION OF LOW PROFILE SUBSTRATE
摘要 The present invention relates to a method to enhance adhesion of a surface of a low profile substrate comprising a step of hydrophilic treating a substrate surface; and a step of chemical copper plating the hydrophilic treated substrate. According to an embodiment of the present invention, in order to implement a fine circuit pattern on the low profile substrate, blister generation is suppressed through surface hydrophilic treatment using air pressure plasma and a chemical copper plating process so that formation of a fine circuit pattern is possible and the adhesion effect with the formed fine circuit pattern is improved. [Reference numerals] (AA) Surface hydrophilic treatment step; (BB) Organic matter removing step on a base surface; (CC) Surface activation step; (DD) Catalyst adsorption step; (EE) Catalyzed step; (FF) Chemical copper plating step; (GG) Dry film (DF) processing step; (HH) Pattern forming step
申请公布号 KR20140047890(A) 申请公布日期 2014.04.23
申请号 KR20120114185 申请日期 2012.10.15
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 SHIM, DA MI;LEE, WOO JIN;NAM, HYO SEUNG
分类号 C08J7/00;H05H1/24;H05K3/18;H05K3/38 主分类号 C08J7/00
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