发明名称 |
METHOD FOR ENHANCING ADHESION OF LOW PROFILE SUBSTRATE |
摘要 |
The present invention relates to a method to enhance adhesion of a surface of a low profile substrate comprising a step of hydrophilic treating a substrate surface; and a step of chemical copper plating the hydrophilic treated substrate. According to an embodiment of the present invention, in order to implement a fine circuit pattern on the low profile substrate, blister generation is suppressed through surface hydrophilic treatment using air pressure plasma and a chemical copper plating process so that formation of a fine circuit pattern is possible and the adhesion effect with the formed fine circuit pattern is improved. [Reference numerals] (AA) Surface hydrophilic treatment step; (BB) Organic matter removing step on a base surface; (CC) Surface activation step; (DD) Catalyst adsorption step; (EE) Catalyzed step; (FF) Chemical copper plating step; (GG) Dry film (DF) processing step; (HH) Pattern forming step |
申请公布号 |
KR20140047890(A) |
申请公布日期 |
2014.04.23 |
申请号 |
KR20120114185 |
申请日期 |
2012.10.15 |
申请人 |
SAMSUNG ELECTRO-MECHANICS CO., LTD. |
发明人 |
SHIM, DA MI;LEE, WOO JIN;NAM, HYO SEUNG |
分类号 |
C08J7/00;H05H1/24;H05K3/18;H05K3/38 |
主分类号 |
C08J7/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|