| 发明名称 |
Lithographic apparatus and device manufacturing method involving a barrier to collect liquid |
| 摘要 |
A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus. |
| 申请公布号 |
US8704998(B2) |
申请公布日期 |
2014.04.22 |
| 申请号 |
US201113012303 |
申请日期 |
2011.01.24 |
| 申请人 |
KOLESNYCHENKO ALEKSEY YURIEVICH;BASELMANS JOHANNES JACOBUS MATHEUS;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;JANSEN HANS;MERTENS JEROEN JOHANNES SOPHIA MARIA;MULKENS JOHANNES CATHARINUS HUBERTUS;PEETERS FELIX GODFRIED PETER;STREEFKERK BOB;TEUNISSEN FRANCISCUS JOHANNES HERMAN MARIA;VAN SANTEN HELMAR;ASML NETHERLANDS B.V. |
发明人 |
KOLESNYCHENKO ALEKSEY YURIEVICH;BASELMANS JOHANNES JACOBUS MATHEUS;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;JANSEN HANS;MERTENS JEROEN JOHANNES SOPHIA MARIA;MULKENS JOHANNES CATHARINUS HUBERTUS;PEETERS FELIX GODFRIED PETER;STREEFKERK BOB;TEUNISSEN FRANCISCUS JOHANNES HERMAN MARIA;VAN SANTEN HELMAR |
| 分类号 |
G03B27/52;G03B27/32;G03F7/20;H01L21/027 |
主分类号 |
G03B27/52 |
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