| 摘要 |
<p>The present invention relates to an electronic device manufacturing method capable of reducing mutual errors in the alignment of different layers. The electronic device manufacturing method comprises a first thin film pattern forming process in which a first photolithography process is performed by using a first photomask on a substrate; and a second thin film pattern forming process in which a second photolithography process is performed by using a second photomask, wherein the first photomask and the second photomask have first transcription patterns including a floodlight part, a light shielding part, and a translucent part; the second photomask is the same as the first photomask; or the second photomask has a second transcription pattern formed by additionally processing the first transcription pattern included in the first photomask. [Reference numerals] (AA) Amount of penetrating light; (BB) Resolution threshold value; (CC) Position</p> |
