发明名称 COATING METHOD OF THIN FILM SILICON OXIDE
摘要 A flame plasma treatment is conducted onto the surface of a target material for coating, and a silicon oxide solution is coated onto the target material for coating. The target material for coating, coated with the silicon oxide solution, is irradiated with an ultraviolet ray. According to the present invention regarding a coating method of a thin film silicon oxide, the target material for coating, is coated with a thin film of silicon oxide, and irradiated with an ultraviolet ray. The thin film silicon oxide is hardened, so as for the surface of a plastic, which is vulnerable to heat, to be coated with the thin film silicon oxide. [Reference numerals] (200) Injection-molding a target material for coating; (300) Flame plasma treatment; (400) Coat silicon oxide; (500) Harden the silicon oxide; (AA) Start; (BB) End
申请公布号 KR20140047263(A) 申请公布日期 2014.04.22
申请号 KR20120113244 申请日期 2012.10.12
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HWANG, JUNG HO;PARK, KWANG HEE
分类号 B05D7/02;B05D3/06;B05D3/08;B05D7/24 主分类号 B05D7/02
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