发明名称 Metal peroxo compounds with organic co-ligands for electron beam, deep UV and extreme UV photoresist applications
摘要 Compositions are disclosed having the formula (3): [C′]k[Ta(O2)x(L′)y]  (3), wherein x is an integer of 1 to 4, y is an integer of 1 to 4, Ta(O2)x(L′)y has a charge of 0 to−3, C′is a counterion having a charge of +1 to +3, k is an integer of 0 to 3, L′is an oxidatively stable organic ligand having a charge of 0 to−4, and L′comprises an electron donating functional group selected from the group consisting of carboxylates, alkoxides, amines, amine oxides, phosphines, phosphine oxides, arsine oxides, and combinations thereof. The compositions have utility as high resolution photoresists.
申请公布号 US8703386(B2) 申请公布日期 2014.04.22
申请号 US201213405587 申请日期 2012.02.27
申请人 BASS JOHN DAVID;KIM HO-CHEOL;MILLER ROBERT DENNIS;SONG QING;SUNDBERG LINDA KARIN;WALLRAFF GREGORY MICHAEL;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BASS JOHN DAVID;KIM HO-CHEOL;MILLER ROBERT DENNIS;SONG QING;SUNDBERG LINDA KARIN;WALLRAFF GREGORY MICHAEL
分类号 G03F7/00;C07C7/00;C07C49/92;G03F7/004;G03F7/029 主分类号 G03F7/00
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