Resist composition, method of forming resist pattern, novel compound, and acid generator

摘要

A resist composition comprising a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) comprising an acid generator (B1) composed of a compound represented by general formula (b1-1) shown below [wherein, X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, provided that a ring skelton of the cyclic group contains an—SO2—bond or an—O—SO2—bond, and at least one carbon atom which is not adjacent to the—SO2—bond or the—O—SO2—bond has an oxygen atom as a substituent; Q1 represents a divalent linking group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; and A+ represents an organic cation]. [Chemical Formula 1] X-Q1-Y1—SO3⊖A⊕  (b1-1)