| 摘要 |
A method for manufacturing a solid state image forming device in one embodiment includes forming a transparent resin layer on a semiconductor substrate having a plurality of photodiode layers formed thereon in a lattice, through R, G, and B color filters that are formed according to a Bayer arrangement; forming a plurality of first microlens mother dies on the transparent resin layer at the positions corresponding to the G color filters in such a manner that the outer peripheries thereof are separated from each other; forming a plurality of second microlens mother dies in such a manner that they are formed to fill the gap between the first microlens mother dies and the outer peripheries thereof are separated from each other; and etching the transparent resin layer with the plurality of first microlens mother dies and the plurality of second microlens mother dies being used as masks. |
