发明名称 Method and apparatus for plasma surface treatment of a moving substrate
摘要 Method and plasma treatment apparatus for treatment of a substrate surface (1) using an atmospheric pressure plasma. An atmospheric pressure plasma is provided in a treatment space (5) between a first electrode (2) and a second electrode (3). Furthermore, a substrate (1) and a mask web (7) in contact with the substrate (1) are provided. A plasma generating power is applied to the first and second electrode (2, 3) for treatment of surface areas of the substrate (1) exposed by the mask web (7), in which the substrate (1) and mask web (7) are moved synchronously through the treatment space (5).
申请公布号 US8702999(B2) 申请公布日期 2014.04.22
申请号 US20090865710 申请日期 2009.01.29
申请人 KORNGOLD BRUNO ALEXANDER;DE VRIES HINDRIK WILLEM;ALDEA EUGEN;FUJIFILM MANUFACTURING EUROPE B.V. 发明人 KORNGOLD BRUNO ALEXANDER;DE VRIES HINDRIK WILLEM;ALDEA EUGEN
分类号 B44C1/22 主分类号 B44C1/22
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