| 摘要 |
The present invention relates to a thin film fabrication method by an electromagnetic wave assisted sol-gel method, and a thin film made by the same. More particularly, in a thin film fabrication method by an electromagnetic wave assisted sol-gel method, the present invention relates to a thin film fabrication method by an electromagnetic wave assisted sol-gel method for forming a thin film by spraying sol while irradiating the surface of a substrate with electromagnetic waves in order to apply energy. A thin film made by an electromagnetic wave assisted sol-gel method has improved density, light transmittance, surface resistance, and surface roughness because the crystallinity is improved and has excellent structural and optical properties because the residual stress is reduced. [Reference numerals] (AA) Comparative example; (BB) Example 1; (CC) Example 2; (DD) Example 3; (EE) Example 4; (FF) Comparative example annealed at 600°C; (GG) Comparative example annealed at 700°C |
