发明名称 |
POLYMER AND COMPOSITIONS THEREOF FOR FORMING PATTERNED LAYERS AFTER IMAGE-WISE EXPOSURE TO ACTINIC RADIATION |
摘要 |
Copolymers and compositions thereof useful for forming self-imageable films encompassing such copolymers are disclosed. Such copolymers encompass norbornene-type repeating units and maleic anhydride-type repeating units where at least some of such and maleic anhydride-type repeating units have been ring-opened. The films formed from such copolymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices. |
申请公布号 |
KR20140047712(A) |
申请公布日期 |
2014.04.22 |
申请号 |
KR20147003619 |
申请日期 |
2012.07.16 |
申请人 |
SUMITOMO BAKELITE COMPANY LIMITED;PROMERUS, LLC |
发明人 |
ONISHI OSAMU;IKEDA HARUO;TAGASHIRA NOBUO;RHODES LARRY;KANDANARACHCHI PRAMOD |
分类号 |
C08L65/00;C08L45/00;C08L63/00;G03F7/004;G03F7/027 |
主分类号 |
C08L65/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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