COMPOSITION FOR FORMATION OF SEMICONDUCTOR SUBSTRATE PASSIVATION FILM, SEMICONDUCTOR SUBSTRATE WITH PASSIVATION FILM AND MANUFACTURING METHOD THEREOF, AND SOLAR BATTERY ELEMENT AND MANUFACTURING METHOD THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a composition for formation of a semiconductor substrate passivation film which makes possible to form a semiconductor substrate passivation film and a p-type diffusion layer in a desired shape by a simple and convenient method.SOLUTION: A composition for formation of a semiconductor substrate passivation film comprises: an organic aluminum compound expressed by the general formula (I); and glass powder including an acceptor element. [Formula (I)], where R's represent an alkyl group with 1-8 carbon atoms independently of each other; n represents an integer of 0-3; Xand Xrepresent an oxygen atom or a methylene group independently of each other; and R, Rand Rrepresent a hydrogen atom or an alkyl group with 1-8 carbon atoms independently of each other.