| 摘要 |
PROBLEM TO BE SOLVED: To provide a deposition processing apparatus both reduced in size and improved in productivity.SOLUTION: A deposition processing apparatus comprises: a deposition processing chamber 14 arranged adjacent to a load lock chamber; deposition means, a roller conveyer for conveying a substrate S in a horizontal direction in the deposition processing chamber 14; a two-stage conveyer 26; and elevation means 28. The two-stage conveyer 26 conveys the substrate S in a horizontal direction in the deposition processing chamber 14, and is arranged between the load lock chamber and the roller conveyer, and has a lower side conveyer 30A and an upper side conveyer 30B arranged so as to be vertically overlapped with each other. The elevation means 28 elevates and lowers the two-stage conveyer 26 between a lowered position at which the upper conveyer 30B is flush with the roller conveyer, and an elevated position at which the lower conveyer 30A is flush with the roller conveyer. |
