| 摘要 |
PROBLEM TO BE SOLVED: To provide a glass substrate in which the static build-up on a surface is effectively suppressed, and a method for manufacturing a glass substrate.SOLUTION: A glass substrate 10 is provided with an element formation surface 12a, and a roughened surface 12b. The element formation surface 12a is a surface where semiconductor elements are formed. The roughened surface 12b is a surface which lies opposite to the element formation surface 12a. The area incremental ratio of roughened surface 12b is at least 0.05%. The area incremental ratio is a value dS calculated by the equation dS=[(S-S)/S]×100(%), based on an actual area Sand a measurement area S. The actual area Sis a surface area calculated from three-dimensional data obtained by measuring a scan range of 1 μm×1 μm of the roughened surface 12b using an atomic force microscope, and is the surface area of the roughened surface 12b in the scan range. The measurement area Sis the area of the geometric shape in the scan range. |
