METHOD AND APPARATUS FOR FORMING PATTERN, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DISPLAY PANEL

摘要

PROBLEM TO BE SOLVED: To form a pattern over the entire surface of a substrate with almost uniform luminous energy of exposure light by dispersing positions of drawing centers of mirrors in the respective beam irradiation regions without inducing periodicity.SOLUTION: A light beam irradiation apparatus is provided, in which a substrate coated with a photoresist is irradiated with a light beam to draw a pattern on the basis of drawing data by use of a spatial optical modulator having a plurality of mirrors arranged in two directions. In a pattern forming method, the substrate is relatively scanned by the light beam irradiation apparatus, and positions of drawing centers of the mirrors in a given drawing region are dispersed so as not induce periodicity in the distribution.