发明名称 |
VACUUM EVAPORATION DEVICE, AND VACUUM EVAPORATION METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum evaporation apparatus and a vacuum evaporation method capable of precisely aligning in an evaporation chamber, or a vacuum evaporation apparatus capable of transferring a substrate stably to the evaporation chamber.SOLUTION: In a vacuum evaporation device and a vacuum evaporation method, an alignment is established between a substrate and a mask, and an evaporation material is evaporated on the substrate. The substrate is transferred either between an evacuatable stocking chamber, to which the substrate can be transferred, and a vacuum vapor deposition chamber or between the vacuum vapor deposition chambers. A pre-alignment is performed in a transfer route for transferring the substrate so as to correct the dispersion of the positions of the substrate transferred into the stocking chambers between the vacuum vapor deposition chamber at the closest position to the stocking chamber and the stocking chamber. |
申请公布号 |
JP2014070242(A) |
申请公布日期 |
2014.04.21 |
申请号 |
JP20120216334 |
申请日期 |
2012.09.28 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
YAMADA RYOTA;ZUSHI AN;KATAGIRI KENJI;WAKABAYASHI MASA |
分类号 |
C23C14/04;H01L51/50;H05B33/10 |
主分类号 |
C23C14/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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