METHOD AND APPARATUS FOR FORMING PATTERN, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DISPLAY PANEL

摘要

PROBLEM TO BE SOLVED: To easily check at high speed the certainty of extraction of drawing data by a DMD (digital micromirror device) with respect to a drawing position and to execute high-quality pattern drawing with a high throughput.SOLUTION: A pattern forming apparatus forms a pattern based on drawing data in a resin film of a substrate by irradiating the substrate with a light beam, while modulating the light beam by use of a spatial optical modulator that drives a plurality of mirror groups arranged in two directions on the basis of the drawing data and relatively moving stage means that holds the substrate coated with the resin film. The drawing data stored in a memory is configured to include discriminable data as a part of the drawing data for discriminating a correction value of the coordinates of the drawing data when the coordinates are corrected by a value corresponding to the resolving power for drawing in a moving direction and/or in a direction orthogonal to the moving direction of the stage means. At the time when the coordinates of the drawing data are corrected, the discriminable data is read out from a part of the drawing data in the memory and a pattern responding to the correction value is drawn.