ALIGNMENT MARK DETECTION DEVICE, PROXIMITY EXPOSURE APPARATUS, AND ALIGNMENT METHOD OF SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide an alignment mark detection device capable of quickly detecting a position of a mask and a position of a substrate, and a proximity exposure apparatus equipped with the alignment mark detection device.SOLUTION: An alignment mark detection device comprises: a mask mark imaging section; a substrate mark imaging section; a lens; and a light flux splitting section. The mask mark imaging section captures an image of a mask alignment mark formed on a mask. The substrate mark imaging section captures an image of a substrate alignment mark formed on a substrate. The lens converges the image light of the mask alignment mark onto the mask mark imaging section, and converges the image light of the substrate alignment mark onto the substrate mark imaging section. The light flux splitting section splits light flux passing through the lens to guide the image light of the mask alignment mark to the mask mark imaging section and guide the image light of the substrate alignment mark to the substrate mark imaging section.