发明名称 EXPOSURE DRAWING APPARATUS, EXPOSURE DRAWING SYSTEM, PROGRAM, AND EXPOSURE DRAWING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an exposure drawing apparatus capable of preventing, on an occasion for drawing images on both surfaces of an exposure target substrate, the drawing of images not corresponding to one another on the respective surfaces.SOLUTION: The exposure drawing apparatus of the present invention includes: first drawing means for drawing an image onto the first surface of an exposure target substrate by exposing the first plane; memory means for memorizing first job information 60A conveying the correspondence of the image information and exposure condition information of the first plane, second job information 60B conveying the correspondence of the image information and exposure condition information of the second plane, and correspondence information of the first job information 60A and second job information 60B; and second drawing means for drawing, on an occasion for drawing an image on the second surface of the exposure target substrate following the drawing of an image on the first surface thereof by exposing the first surface under exposure conditions expressed by the first job information 60A, an image expressed by the second job information 60B on the second surface by exposing the second surface under exposure conditions expressed by the second job information whose correspondence to the first job information 60A used on the occasion for drawing the image on the first plane has been established based on the correspondence information.
申请公布号 JP2014071157(A) 申请公布日期 2014.04.21
申请号 JP20120215121 申请日期 2012.09.27
申请人 FUJIFILM CORP 发明人 OZAKI YUKIHISA;SATO JUNICHI
分类号 G03F7/20;H01L21/027;H05K3/00 主分类号 G03F7/20
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