THERMAL TREATMENT APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a thermal treatment apparatus in which a delivery operation of a substrate between treatments is reduced.SOLUTION: A thermal treatment apparatus 100 includes a stage 20 for holding a substrate W. A heat treatment plate 22 of the stage 20 is provided with a heater 23 and a cooling mechanism 24. A substrate delivery part 10 delivers the unprocessed substrate W to the stage 20, and the stage 20 subjects the substrate W to alignment processing and a preheating treatment. The stage 20 then rises to a position facing a lamp house 50 and a flash lamp FL irradiates the substrate W with flash light. The stage 20 then descends and the substrate W is subjected to a cooling treatment on the stage 20. All treatments relating to a flash heating treatment are executed while the substrate W is held by the stage 20, thereby eliminating delivery of the substrate W between the respective treatments, thus eliminating the need for a transfer robot for transferring the substrate W between the respective treatments to allow an increase in footprint of the thermal treatment apparatus 100 to be suppressed.