| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a master mold to be used for fabricating a replica mold having the design pattern data substantially similar to those of the master mold and to provide another method for producing the replica mold by utilizing the method for producing the master mold.SOLUTION: When a tentative replica mold is fabricated by nanoimprint lithography on the basis of a tentative master mold to be fabricated on the basis of the tentative master pattern data to be created from the design pattern data of the replica mold, the method for producing the master mold comprises the steps of: calculating a vector of such a positional shift of a fine rugged pattern, in which the fine rugged pattern is shifted from a formation-planned position in the replica mold, on the basis of the design pattern data of the replica mold; correcting the position of the fine rugged pattern, which corresponds to the position-shifted fine rugged pattern, in the tentative master pattern data on the basis of the calculated vector of the positional shift to create the corrected master pattern data; and producing the master mold on the basis of the corrected master pattern data. |
