| 摘要 |
PROBLEM TO BE SOLVED: To suppress occurrence of sealing failure in a gate valve.SOLUTION: A semiconductor manufacturing device includes a chamber CH1 having an opening OP1 on one face OS1, and a gate valve GV1 closing the opening OP1. The gate valve GV1 includes a valve element VL1 closing the opening OP1 by pressing a peripheral edge portion positioned around the opening OP1 of the chamber CH1, while covering the opening OP1 from an outer side of the chamber CH1, a detecting portion for detecting inclination of the valve element VL1 to the one face OS1, an adjusting portion for changing the inclination of the valve element VL1, and a control portion CU1 for controlling the adjusting portion on the basis of the inclination detected by the detecting portion. |
