| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of irradiating a side face of an exposure target with exposure light at a substantially uniform intensity by adding only optical path varying means for the exposure light to an existing exposure apparatus without tilting the exposure target, and thereby, capable of flexibly processing a side face at any angle including a vertical side face.SOLUTION: The exposure apparatus aims to expose a resist film 110 on a side face 101 of an exposure target 100 and includes: a photomask 20 including any mask pattern 22 drawn on a transparent substrate; a light source 10 for irradiating the mask pattern 22 with exposure light; a projection optical system 30 for projecting the mask pattern 22; and optical path varying means 40 which is positioned in a direction intersecting the side face 101 of the exposure target 100 and varies the optical path of the exposure light that has passed in the projection optical system 30 to expose the resist film 110 on the side face 101 of the exposure target 100. |
