发明名称 SAMPLE TABLE, AND PLASMA PROCESSING APPARATUS EQUIPPED WITH THE SAME
摘要 PROBLEM TO BE SOLVED: To stably control a sample temperature to a desired one by accurately predicting the sample temperature.SOLUTION: In this sample table including a coolant passage for cooling the inside of the table, a heater for heating the inside, a temperature sensor for measuring the temperature in the inside, and a temperature control device for controlling sample temperatures during plasma processing, the temperature control device sets a coolant temperature to a desired temperature, approximates the correlation between the temperature change of the temperature sensor with the passage of time and the temperature change of the sample with the passage of time, the temperature of the temperature sensor obtained after subtracting the desired temperature, the temperature of the sample obtained after subtracting the desired temperature, and power supplied to the heater, which are measured in advance under a state of no plasma processing, by a simultaneous linear differential equation, predicts the temperature of the temperature sensor during plasma processing and the temperature of the sample during plasma processing from the power supplied to the heater during plasma processing on the basis of Luenberger's states observer based on the approximated simultaneous linear differential equation, and feed-back controls the temperature of the sample during plasma processing using the predicted temperature of the sample.
申请公布号 JP2014068032(A) 申请公布日期 2014.04.17
申请号 JP20130252861 申请日期 2013.12.06
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 KOTO NAOYUKI;TSUBONE TSUNEHIKO
分类号 H01L21/3065;H01L21/683 主分类号 H01L21/3065
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