发明名称 SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
摘要 A semiconductor device may include a substrate having a lower via-hole, an epitaxial layer having an opening exposing a top surface of the substrate, a semiconductor chip disposed on the top surface of the substrate and including first, second, and third electrodes, an upper metal layer connected to the first electrode, a supporting substrate disposed on the upper metal layer and having an upper via-hole, an upper pad disposed on the substrate and extending into the upper via-hole, a lower pad connected to the second electrode in the opening, and a lower metal layer covering a bottom surface of the substrate and connected to the lower pad through the lower via-hole.
申请公布号 US2014103539(A1) 申请公布日期 2014.04.17
申请号 US201314021269 申请日期 2013.09.09
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 MIN BYOUNG-GUE;KO SANG CHOON;LIM JONG-WON;AHN HOKYUN;YOON HYUNG SUP;MUN JAE KYOUNG;NAM EUN SOO
分类号 H01L21/768;H01L21/02;H01L21/28;H01L23/48 主分类号 H01L21/768
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