发明名称 LIQUID PROCESSING DEVICE
摘要 <p>A liquid treatment apparatus includes a substrate holder (21) that holds a substrate horizontally and rotates the substrate, a treatment liquid nozzle (82) that supplies a treatment liquid to the substrate held by the substrate holder, a cup (40) that is arranged outside of a peripheral edge of the substrate held by the substrate holder and receives the treatment liquid which has been supplied to the substrate by the treatment liquid nozzle, a top plate (32) that covers the substrate held by the substrate holder from above, a top plate rotation driving mechanism that rotates the top plate, and a liquid receiving member (130) that surrounds a peripheral edge of the top plate and has a circular liquid receiving space (132).</p>
申请公布号 KR20140045904(A) 申请公布日期 2014.04.17
申请号 KR20137006440 申请日期 2012.08.01
申请人 TOKYO ELECTRON LIMITED 发明人 ITOH NORIHIRO;AIURA KAZUHIRO;SHINDO NAOKI;HACHIYA YOSUKE
分类号 H01L21/302;H01L21/027 主分类号 H01L21/302
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