SUBSTRATE SUPPORT APPARATUS AND SUBSTRATE PROCESS APPARATUS

摘要

The present invention relates to a substrate supporting apparatus and a substrate processing apparatus, including: a chamber for forming a processing space; a gas jetting unit which supplies a treatment gas into the chamber; and a substrate support which is arranged inside the chamber, and which supports the substrate. The substrate support is prepared with a flow path which supplies a purge gas to the upper edge and lower edge of the substrate, through respective flow ducts, so as to evenly supply the purge gas to the edge portions of the substrate.