| 摘要 |
The present invention relates to a lid assembly of a plasma processing apparatus, which is combined to the open top of a process chamber, in which a plasma process is performed, for sealing the internal space of the process chamber. The lid assembly comprises: a lid plate having a flat plate shape, which is provided at an upper side of the process chamber, and at the center of the bottom surface of which a stepped portion is formed to incline upward; a central nozzle which is inserted into a penetration hole formed at the center of the lid plate; a plurality of outer nozzles which is radially formed inside the lid plate, and an end of which spray process gas through the stepped surface of the stepped portion. |
