发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device having a nonvolatile memory cell of high operation speed and a high rewritable cycle and a nonvolatile memory cell of high reliability.SOLUTION: In a split gate type nonvolatile memory in which memory gate electrodes 11a and 11b are formed in a shape of sidewalls of control gate electrodes 5a and 5b, it is possible to produce a memory chip having a memory of high operation speed and a high rewritable cycle and a memory of high reliability at a low cost by jointly loading memory cells having different memory gate length La and Lb in an identical chip.
申请公布号 JP2014068049(A) 申请公布日期 2014.04.17
申请号 JP20140011107 申请日期 2014.01.24
申请人 RENESAS ELECTRONICS CORP 发明人 KAWASHIMA YOSHIYUKI
分类号 H01L21/336;H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/336
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