发明名称 Silicon Breast Implant Which Minimizes Stress Concentration And Method For Manufacturing Same
摘要 The present invention relates to a silicon breast implant which minimizes stress concentration applied thereto after being inserted into the human body to maximize the resistance of same to fatigue-induced rupture, thereby improving the durability of the implant. The breast implant may include an elegant patch-adhesion portion having a thin thickness so as to provide superior overall feel and improve the appearance of the product. Further, the breast implant has a silicon shell defining an outer wall thereof and the patch adhesion portion for closing, from the outside, a hole formed in a bottom surface of the silicon shell so that the patch adhesion portion is increased in strength to maximize adhesion durability, safety of use, and effectiveness. The silicon shell has a uniform overall thickness, and the patch adhesion portion comprises a patch hole through which a patch adheres to a lower end of the silicon shell using an adhesive material.
申请公布号 US2014107779(A1) 申请公布日期 2014.04.17
申请号 US201214116417 申请日期 2012.05.08
申请人 YU WON SEOK 发明人 YU WON SEOK
分类号 A61F2/12;B29C41/14;B29C65/00 主分类号 A61F2/12
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