NEGATIVE RESIST COMPOSITION, AND PRODUCTION METHOD OF RESIST PATTERN AND ELECTRONIC COMPONENT USING THE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a negative resist composition having an improved sensitivity margin and being capable of obtaining a pattern with high sensitivity, high resolution and low LER in pattern formation by irradiation with an electron beam or EUV, and to provide a production method of a resist pattern and an electronic component using the resist composition.SOLUTION: The negative resist composition comprises a phenolic compound (A) having a molecular weight of 400 to 2500, which includes two or more phenolic hydroxyl groups in one molecule and at least one substituent selected from the group consisting of a hydroxymethyl group and an alkoxymethyl group at an ortho position of the phenolic hydroxyl group in one molecule; a compound (B) having a boiling point of 150°C or higher and having a tertiary alcoholic hydroxyl group; and an acid generator (C). The content of the phenolic compound (A) in the whole solid content of the negative resist composition is 70 wt.% or more.