| 摘要 |
The present invention relates to a sputter coating device including a support device having a fastening flange and at least one support profile, and at least one sputter magnetron provided in parallel to the support profile in the support device. The at least one support profile has a free end portion and a connection end portion coupled with the fastening flange, and the at least one sputter magnetron has a free end portion and a connection end portion coupled with a supply device. The supply device is provided at the fastening flange facing the sputter magnetron, and the support profile passes through a first suction opening formed in the fastening flange. A vacuum pump is provided in the first suction opening formed in the fastening flange and facing the support profile. |
