| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a photomask, a photomask, a pattern transfer method, and a method for manufacturing a flat panel display each capable, on an occasion for manufacturing a multi-gradation photomask, of realizing the precision of a final product without compromising production efficiency regardless of positional deviations attributed to alignment deviations.SOLUTION: The multi-gradation photomask has a transfer pattern including a translucent unit, a shading unit, a first semi-translucent unit, and a second semi-translucent unit having a translucency different from that of the first semi-translucent unit, on a transparent substrate. Drawing data on a first draw setting for drawing the first semi-translucent unit or on a second draw setting for drawing the second semi-translucent unit are formed so as to yield, on the border of the first semi-translucent unit and second semi-translucent unit, an overlap margin confined to a prescribed range specific to the overlapping peripheral edges of the first semi-translucent unit and second semi-translucent unit. |
