发明名称 PROCESSING LIQUID SUPPLY METHOD, PROCESSING LIQUID SUPPLY APPARATUS AND STORAGE MEDIUM
摘要 <p>The present invention provides a technique for reducing treating fluid consumed for removing bubbles from a filter part and reducing driving time when the filter part is attached to a treating fluid supply path. The present invention performs the process of filling the treating fluid in the filter part; the process of forming the inside of the filter part into a first pressure atmosphere, which is negative pressure, for removing the bubbles from the filter part; then, the process of boosting the inside of the filter part; then, the process of controlling the treating fluid to through flow the filter part from a first side with the second side of the filter part being in a second pressure atmosphere higher than the first pressure atmosphere; and the process of performing fluid treatment by supplying the treating fluid through flew the filter part to an object through a nozzle. The bubbles can be removed rapidly through above processes. [Reference numerals] (1) Resist applying device; (10) Control part; (2) Resist supplying source; (25) pump; (3) Filter part; (4) Voltage reducing part; (AA) Drain path; (BB) Air; (CC) Exhaust; (DD) Air supply; (EE) Air discharge</p>
申请公布号 KR20140045879(A) 申请公布日期 2014.04.17
申请号 KR20130113946 申请日期 2013.09.25
申请人 TOKYO ELECTRON LIMITED 发明人 YOSHIDA YUICHI;NAITOU RYOUICHIROU;FURUSHO TOSHINOBU
分类号 H01L21/02;H01L21/027 主分类号 H01L21/02
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