| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a photo spacer, which shows excellent adhesiveness to a substrate, allows formation of a photo spacer having a high elastic recovery rate and breaking strength, and leaves little development residue.SOLUTION: The photosensitive resin composition for a photo spacer includes as a binder polymer, an acrylic resin having a repeating unit having a cyclic structure in a main chain and a repeating unit having two or more oxyalkylene groups in a side chain. |
