发明名称 FINFET CIRCUITS WITH VARIOUS FIN HEIGHTS
摘要 A fin field-effect transistor (finFET) assembly includes a first finFET device having fins of a first height and a second finFET device having fins of a second height. Each of the first and second finFET devices includes an epitaxial fill material covering source and drain regions of the first and second finFET devices. The epitaxial fill material of the first finFET device has a same height as the epitaxial fill material of the second finFET device.
申请公布号 US2014103451(A1) 申请公布日期 2014.04.17
申请号 US201213654010 申请日期 2012.10.17
申请人 INTERNATIONAL BUSINESS MACHINES CORP;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 OUYANG QIQING C.;KERBER PRANITA;REZNICEK ALEXANDER
分类号 H01L27/088 主分类号 H01L27/088
代理机构 代理人
主权项
地址