发明名称 Saw debris reduction in MEMS devices
摘要 <p>An improved MEMS device and method of making. Channels are formed in a first substrate around a plurality of MEMS device areas previously formed on the first substrate. Then, a plurality of seal rings are applied around the plurality of MEMS device areas and over at least a portion of the formed channels. A second substrate is attached to the first substrate, then the seal ring surrounded MEMS device areas are separated from each other. The channels include first and second cross-sectional areas. The first cross-sectional area is sized to keep saw debris particles from entering the MEMS device area.</p>
申请公布号 EP2147894(B1) 申请公布日期 2014.04.16
申请号 EP20090165255 申请日期 2009.07.10
申请人 HONEYWELL INTERNATIONAL INC. 发明人 RIDLEY, JEFF A.;GLENN, MAX;NOHAVA, JAMES C.;HORNING, ROBERT D.;REKSTAD, JAME
分类号 B81C1/00 主分类号 B81C1/00
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