| 摘要 |
The vaporization source has a cathode body (3) including a vaporization material (31) as a cathode (32) for generation of arc discharge at a vaporization upper surface (33) of the cathode. The body is limited by a cathode base (34) in an axial direction, and by the surface in another axial direction. A circular magnetic field source (2) is arranged parallel or anti-parallel to a surface normal (300) of the surface, and concentric to the normal. A magnetic field reinforcement ring (4) is arranged in front of the base on a side turned away from the surface at a preset distance (A2). |
