| 摘要 |
There are provided a two-fluid nozzle for effectively performing a liquid process on a substrate while suppressing a damage on the substrate, and a substrate liquid processing apparatus, a substrate liquid processing method and a storage medium using the two-fluid nozzle. The two-fluid nozzle includes a first liquid discharge hole for discharging a first liquid and a gas discharge hole for discharging a gas, and discharges, toward a target object, a mixed fluid of the first liquid discharged from the first liquid discharge hole and the gas discharged from the gas discharge hole. The mixed fluid is mixed at an outside of the two-fluid nozzle. The two-fluid nozzle further includes a second liquid discharge hole for supplying a second liquid toward an outer periphery of a target spot on the target object or toward an inner side of the outer periphery of the target spot. |
