发明名称 |
STRIPPING AND CLEANING COMPOSITIONS FOR REMOVAL OF THICK FILM RESIST |
摘要 |
A stripping and cleaning composition suitable for removal of a film resist comprises: about 2-55 wt% of one or more alkanolamine, or one or more morpholin, or a mixture thereof; about 20-94 wt% of one or more organic solvent; and about 0.5-60 wt% of water, based on the total weight of the composition. |
申请公布号 |
KR20140045275(A) |
申请公布日期 |
2014.04.16 |
申请号 |
KR20130119920 |
申请日期 |
2013.10.08 |
申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
EGBE MATTHEW I.;WU AIPING;RAO MADHUKAR BHASKARA |
分类号 |
G03F7/42 |
主分类号 |
G03F7/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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