发明名称 STRIPPING AND CLEANING COMPOSITIONS FOR REMOVAL OF THICK FILM RESIST
摘要 A stripping and cleaning composition suitable for removal of a film resist comprises: about 2-55 wt% of one or more alkanolamine, or one or more morpholin, or a mixture thereof; about 20-94 wt% of one or more organic solvent; and about 0.5-60 wt% of water, based on the total weight of the composition.
申请公布号 KR20140045275(A) 申请公布日期 2014.04.16
申请号 KR20130119920 申请日期 2013.10.08
申请人 AIR PRODUCTS AND CHEMICALS, INC. 发明人 EGBE MATTHEW I.;WU AIPING;RAO MADHUKAR BHASKARA
分类号 G03F7/42 主分类号 G03F7/42
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