发明名称 |
Multiple measurement techniques including focused beam scatterometry for characterization of samples |
摘要 |
A system for monitoring thin-film fabrication processes is herein disclosed. Diffraction of incident light is measured and the results are compared to a predictive model based on at least one idealized or nominal structure. The model and/or the measurement of diffracted incident light may be modified using the output of one or more additional metrology systems. |
申请公布号 |
US8699027(B2) |
申请公布日期 |
2014.04.15 |
申请号 |
US201213423866 |
申请日期 |
2012.03.19 |
申请人 |
WOLF ROBERT GREGORY;KOTELYANSKII MICHAEL J.;RUDOLPH TECHNOLOGIES, INC. |
发明人 |
WOLF ROBERT GREGORY;KOTELYANSKII MICHAEL J. |
分类号 |
G01J4/00;G01B11/02;G01B11/06;G01N21/21 |
主分类号 |
G01J4/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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