发明名称 |
Debris removal in high aspect structures |
摘要 |
A system for removing debris from a surface of a photolithographic mask is provided. The system includes an atomic force microscope with a tip supported by a cantilever. The tip includes a surface and a nanometer-scaled coating disposed thereon. The coating has a surface energy lower than the surface energy of the photolithographic mask. |
申请公布号 |
US8696818(B2) |
申请公布日期 |
2014.04.15 |
申请号 |
US201213652114 |
申请日期 |
2012.10.15 |
申请人 |
RAVE, LLC;RAVE LLC |
发明人 |
ROBINSON TOD EVAN;ARRUZA BERNABE J.;ROESSLER KENNETH GILBERT |
分类号 |
B08B7/00;B08B9/00 |
主分类号 |
B08B7/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|