| 摘要 |
<p>The present invention relates to an apparatus for discharging an exhaust gas which includes an exhaust pipe which is connected to a semiconductor process apparatus for discharging an exhaust gas in the semiconductor process apparatus; a pump which is arranged in the exhaust pipe and pumps the inner part of the semiconductor process apparatus; and a sub gas supply pipe which is arranged in back of the pump in the exhaust pipe to help the exhaust of gas. According to the present invention, the discharge speed of an exhaust gas can be greatly increased by supplying a sub gas to the exhaust pipe in the sub gas supply pipe. The failure of the pump and the blockage of the exhaust pipe can be prevented by maintaining the stable flow of a harmful gas exhausted. Ultimately, the quality and the productivity of semiconductor can be improved.</p> |
