发明名称 Avalanche photodiode and method for manufacturing the avalanche photodiode
摘要 An avalanche photodiode including a first electrode; and a substrate including a first semiconductor layer of a first conduction type electrically connected to the first electrode, in which at least an avalanche multiplication layer, a light absorption layer, and a second semiconductor layer of a second conduction type with a larger band gap than the light absorption layer are deposited on the substrate. The second semiconductor layer is separated into inner and outer regions by a groove formed therein, the inner region electrically connected to a second. With the configuration, the avalanche photodiode has a low dark current and high long-term reliability. In addition, the outer region includes an outer trench, and at least the light absorption layer is removed by the outer trench to form a side face of the light absorption layer. With the configuration, the dark current can be further reduced.
申请公布号 US8698268(B2) 申请公布日期 2014.04.15
申请号 US201113160286 申请日期 2011.06.14
申请人 YAGYU EIJI;ISHIMURA EITARO;NAKAJI MASAHARU;MITSUBISHI ELECTRIC CORPORATION 发明人 YAGYU EIJI;ISHIMURA EITARO;NAKAJI MASAHARU
分类号 H01L31/107 主分类号 H01L31/107
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